Processing
Vacuum Furnaces
Five-Zone Split Tube Furnace – MTI OTF-1200X-V (MTI Corporation / KJ Group)
Main function
Annealing, diffusion, sintering and thermal processing of samples in vacuum or controlled gas atmosphere up to 1200 °C, with five independently controlled heating zones that create either a long uniform temperature zone or a smooth temperature gradient
Technical specifications
- Model: OTF-1200X-V five-zone split tube furnace
- Manufacturer: MTI Corporation (USA) / KJ Group
- Heating configuration: 5 independently controlled heating zones
- Maximum temperature: 1100 °C (< 1 hour)
- Continuous working temperature: 1000 °C
- Heating rate: up to 20 °C/min
- Temperature controller: five 30-segment programmable PID controllers (one per zone), with over-temperature and broken-thermocouple protection
- Thermocouple: K-type (one per zone)
- Heating element: Fe-Cr-Al alloy
- Process tube: fused quartz tube, 80 mm O.D. (3 in I.D.), with stainless steel vacuum flanges, valve and pressure gauge
- Atmosphere: vacuum (about 10-2 torr with a mechanical pump) or flowing gas
- Furnace structure: split design, double-layer steel casing with cooling fans
- Communication: RS-485 port
Purpose of use
EN: Annealing, diffusion and sintering of samples in various atmospheres (vacuum, inert or reactive gas), and heat treatment of thin films and powders over a long uniform hot zone, or under a controlled temperature gradient set by the five zones, for materials science research.
VI: Ủ nhiệt, khuếch tán và thiêu kết mẫu trong nhiều môi trường khí quyển khác nhau (chân không, khí trơ hoặc khí phản ứng), cũng như xử lý nhiệt màng mỏng và bột trên vùng nhiệt đồng đều dài, hoặc dưới gradient nhiệt độ được đặt bằng năm vùng gia nhiệt, phục vụ nghiên cứu khoa học vật liệu.
High-Temperature Tube Furnace – MTI GSL-1300X (MTI Corporation, USA)
Main function
High-temperature heat treatment (annealing, sintering, synthesis) of powders, ceramics and thin films in vacuum or controlled gas atmosphere up to 1100 °C
Technical specifications
- Model: GSL-1300X tube furnace
- Manufacturer: MTI Corporation (USA)
- Maximum temperature: 1100 °C
- Power supply: AC 220 V, 50/60 Hz
- Temperature controller: digital PID controller
- Monitoring: analog working-current (A) and working-voltage (V) meters on the front panel
- Atmosphere: vacuum or flowing gas, via stainless steel vacuum flanges with valve and gauge
Purpose of use
EN: High-temperature heat treatment of samples in vacuum or controlled atmosphere up to 1100 °C, including annealing, sintering and solid-state synthesis of oxide ceramics, powders and thin films for materials science research.
VI: Xử lý nhiệt mẫu ở nhiệt độ cao trong chân không hoặc môi trường khí có kiểm soát đến 1100 °C, bao gồm ủ nhiệt, thiêu kết và tổng hợp pha rắn gốm oxit, bột và màng mỏng phục vụ nghiên cứu khoa học vật liệu.
Dual-Zone Split Tube Furnace – MTI OTF-1200X-II [Not ready to use]
Main function
Thermal processing, sintering and synthesis of powder and bulk materials under vacuum or controlled gas atmosphere up to 1000 °C, with temperature-gradient control provided by two independently controlled heating zones
Technical specifications
- Model: OTF-1200X-II dual-zone split tube furnace
- Manufacturer: MTI Corporation (USA) / Hefei Kejing Materials Technology Co., Ltd. (China)
- Heating configuration: 2 independently controlled heating zones
- Maximum temperature: 1000 °C
- Continuous working temperature: 1000 °C
- Heating rate: up to 20 °C/min
- Temperature controller: two 30-segment programmable PID controllers (one per zone)
- Thermocouple: K-type (one per zone)
- Heating element: Fe-Cr-Al alloy
- Process tube: fused quartz tube with stainless steel vacuum flanges
- Atmosphere: vacuum (about 10-2 torr with a mechanical pump) or flowing gas
- Furnace structure: split design with door interlock, double-layer steel casing with cooling fans
Purpose of use
EN: Synthesis of oxide materials, sintering and annealing of samples, crystal growth, and chemical vapor deposition (CVD) processes under vacuum or controlled gas atmosphere for materials science research, using the two independent heating zones to create temperature gradients (e.g. for vapor transport and CVD growth).
VI: Tổng hợp vật liệu oxit, thiêu kết và ủ nhiệt mẫu, nuôi tinh thể và các quy trình lắng đọng hơi hóa học (CVD) trong môi trường chân không hoặc khí có kiểm soát phục vụ nghiên cứu khoa học vật liệu, sử dụng hai vùng gia nhiệt độc lập để tạo gradient nhiệt độ (ví dụ cho vận chuyển hơi và nuôi màng bằng CVD).