Facilities

1. Sputtering systems

+ Univex 450 imported from Germany in 2005 used for thin film fabrication based on RF & DC magnetron sputtering mechanism. This system uses turbotronic pump as a secondary pumping system, thus the lowest base pressure can obtain the value of ~ 1×10^-6 torr.

+ Large hand-made sputtering system was operated in 2012.

2. Instruments

 

3. Other Facilities