Sputtering systems

1. The Univex 450 direct-current (dc) and radio-frequency (rf) magnetron sputtering system, made in Germany, prepare thin films with few nanometer to micrometer. The minimum based pressure can be evacuated to 1×10-6 (Torr) with Turbotronic vacuum pump.

UNIVEX 450 system

2. The magnetron sputtering system with oil diffusion vacuum pump use to prepare thin films in lagre scale.